教育背景：
1998.9 -2002.7? 山東大學(xué) 信息科學(xué)與工程學(xué)院??? 學(xué)士
2003.9 -2009.7? 中國(guó)科學(xué)院微電子研究所???????? 博士
工作簡(jiǎn)歷：
2009.7 –至今? 中國(guó)科學(xué)院微電子研究所

高k柵介質(zhì)/金屬柵技術(shù)

1. Gaobo Xu, Qiuxia Xu, Thermal stability of HfON, HfSiON and HfTaON gate dielectrics, 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings, 2008, 1284-1287
2. Gaobo Xu, Qiuxia Xu, Characteristics of high-quality HfSiON gate dielectric prepared by physical vapor deposition, Chinese Physics B, 2009, 18 (2): 768-772
3. Gaobo Xu, Qiuxia Xu, Thermal stability of HfTaON films prepared by physical vapor deposition, Journal of Semiconductors, 2009, 30 (2): 023002
4. Gaobo Xu, Qiuxia Xu, Characteristics of HfSiAlON Gate Dielectric Prepared by Physical Vapor Deposition, ECS Transactions, 2011, 34 (1) : 495-501